Aluminum Targets

Print Email

MATERIAL OVERVIEW

Aluminum (Al) is a silvery white, soft, ductile metal that is the third most abundant element (after oxygen and silicon) and makes up about 8% by weight of the Earth's crust. Aluminum is remarkable for its light weight, strength, durability and for its ability to resist corrosion, due to the formation of an extremely thin yet very strong layer of oxide film. Other useful properties of aluminum are its high electrical and thermal conductivity, and its reflectivity; it is a good reflector of visible light and infrared radiation.

Sputtering

Sputtering is a process of dislodging atoms from a target material, such as a metal, to coat a thin film onto a surface (substrate). One method involves introducing a controlled gas, usually chemically inert argon, into a vacuum chamber, electrically energizing a cathode to establish a self-sustaining plasma, and then accelerating the ions from this plasma into a source material, the target. The target is eroded by the arriving ions via energy transfer and is ejected in the form of neutral particles - atoms, clusters of atoms, or molecules. A substrate is placed in the path of these ejected particles, to be coated by a thin film of the source material.

Thin film deposition uses sputtering to apply coatings of pure materials onto the surface of objects. The coatings are usually in the thickness range of angstroms to microns. Some applications for thin film deposition are the manufacture of mirrors, hard disk drives, electronic components, LEDs, optical coatings, hard coatings on cutting tools, thin film solar cells, and thin-film batteries.

ESPI manufactures high purity aluminum targets in thicknesses starting at 0.001” (.025mm) and diameters of up to 6” (150mm). Whatever your requirement, we can probably make it, just ask.

GENERAL PROPERTIES

Symbol:

Al

Atomic Number:

13

Atomic Weight:

26.98154

Density:

2.6989 gm/cc

Melting Point:

660.37 oC

Boiling Point:

2467 oC

Thermal Conductivity:

2.37 W/cm/ K @ 298.2  K

Electrical Resistivity:

2.6548 microhm-cm @ 20

Electronegativity:

1.5 Paulings

Specific Heat:

0.215 Cal/g/ K @ 25

Heat of Vaporization:

67.9 K-cal/gm atom at 2467 oC

Heat of Fusion:

2.55 Cal/gm mole

TYPICAL ANALYSES - Impurities in ppm

Material / Purity:

4N

5N

Ca

1

1.0

Cu

13

1.0

Mg

7

2.0

Mn

1

1.0

Si

23

2.0

Fe

52

2.0

SPUTTERING TARGETS

Material

Purity

Aluminum Sputtering Target 2"D X .125"T

3N, 4N, 5N

Aluminum Sputtering Target 2"D X .250"T

3N, 4N, 5N

Aluminum Sputtering Target 3"D X .125"T

3N, 4N, 5N

Aluminum Sputtering Target 3"D X .250"T

3N, 4N, 5N

Aluminum Sputtering Target 4"D X .125"T

3N, 4N, 5N

Aluminum Sputtering Target 4"D X .250"T

3N, 4N, 5N

Targets are made to order and packaged individually. Call or email for additional diameters, thicknesses or custom sizes.

 

Material Safety Data Sheet - MSDS

 Aluminum MSDS

 

 

Technical Data Sheets

Machining Aluminum